Defect Review SEM System
Hitachi RS-5500
This SEM review station provides high speed and high accuracy SEM imaging of inspected defects for 65nm and even 45nm device manufacturing based on Hitachi's CD SEM experience.


  • 4 image capture at the same time (second electron, left and right oblique and voltage contrast)
  • Defect classification by ADC
  • Effective sampling by RI-1000 to reduce the time of all reviews

Available: Taiwan




Dark Field Wafer Defect Inspection System
Hitachi IS-3000
Hitachi IS-3000 is capable of detecting smaller than 40 nm defects on patterned wafers with high sensitivity and stable high throughput.


  • ecipe set up in minutes
  • High Throughput and high sensitivity inspection
  • DFC (Dark field real time classification)

Available: Taiwan





Unpatterned Wafer Surface Inspection System
Hitachi LS-6800
Hitachi LS-6800 is capable of detecting smaller than 40 nm defects on unpatterned wafers with high sensitivity and stable high throughput.


  • ulti-direction Detectors system
  • igh Throughput and high sensitivity inspection
  • evel Inspection Function

Available: Taiwan



 

Defect Review SEM System
Dark Field Wafer Defect
Inspection System
Unpatterned Wafer Surface
Inspection System


Taiwan Contact:
Sharon_Chen@spirox.com.tw
Tel. +886 3 573 8099 ext. 2912

 

 

 
    ©2010 Copyright Spirox Corporation. All Rights Reserved. Legal Notices