Bright Field Wafer Inspection System
Accretech Win-Win 50
Accretech Win-Win 50 is based on state-of-the-art optics, a high speed image processing system and an extraordinarily precise wafer stage. The Win-Win 50 can handle wafers up to 300 mm.
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- Confocal optics provide higher resolution and less imaging influence from underlayer which can increase the sensitivity of surface layer
- Global mode provides higher sensitivity in memory area than traditional Die-to-Die mode
- RDC provides effective defect classification and is easy to operate due to rule-based algorithm
- High stage accuracy provides better defect review after inspection
Available: Taiwan, China |
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Deep UV Wafer Inspection System
Accretech HA-3000
Accretech HA-3000 is a next generation DUV optical inspection system to inspect defects on pattern wafers for nano scale defect inspection down to 90nm, 65nm even 45nm devices.
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- 266nm laser illumination provides higher image contrast for ArF resist
- Hybride provides higher sensitivity in memory cell than traditional Die-to-Die mode
- SR optics provide higher image quality by polarization technology
- LIM algorithm can reduce noise due to color variation between different die and different oxide thickness
Available: Taiwan, China |
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Deep UV Wafer Inspection System
Hitachi HA-3000
Hitachi HA-3000 is a next generation DUV optical inspection system to inspect defects on pattern wafers for nano scale defect inspection down to 90nm, 65nm even 45nm devices.
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- 266nm laser illumination provides higher image contrast for ArF resist
- Hybride provides higher sensitivity in memory cell than traditional Die-to-Die mode
- SR optics provide higher image quality by polarization technology
- LIM algorithm can reduce noise due to color variation between different die and different oxide thickness
Available: Taiwan |
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Defect Review SEM System
Hitachi RS-4000
This SEM review station provides high speed and high accuracy SEM imaging of inspected defects for 90nm and even 65nm device manufacturing based on Hitachi's CD SEM experience.
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- 4 image capture at the same time (second electron, left and right oblique and voltage contrast)
- Defect classification by ADC
- Effective sampling by RI-1000 to reduce the time of all reviews
Available: Taiwan |
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Electron Beam Wafer Inspection System
Hitachi I-6300
This system integrates Hitachi's expertise of both E-beam and inspection to provide a stable and high sensitivity E-beam inspection system.
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- Provides both positive and negative voltage for best image comparison (traditional approaches use positive voltage)
- No focus and calibration needed after stage rotation
- High speed and high sensitivity inspection
Available: Taiwan |
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Bright Field Wafer Inspection System
Deep UV Wafer Inspection System
Defect Review SEM System
Electron Beam Wafer Inspection System
Taiwan Contact:
Sandy_Lai@spirox.com.tw
Tel. +886 3 573 8099 ext. 5019
China Contact:
Jessica_Chew@spirox.com.tw
Tel. +86 21 6108-1858
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