
Defect Review SEM System
Hitachi RS-5500
This SEM review station provides high speed and high accuracy SEM imaging of inspected defects for 65nm and even 45nm device manufacturing based on Hitachi's CD SEM experience.

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- 4 image capture at the same time (second electron, left and right oblique and voltage contrast)
- Defect classification by ADC
- Effective sampling by RI-1000 to reduce the time of all reviews
Available: Taiwan |
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Dark Field Wafer Defect Inspection System
Hitachi IS-3000
Hitachi IS-3000 is capable of detecting smaller than 40 nm defects on patterned wafers with high sensitivity and stable high throughput.

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- ecipe set up in minutes
- High Throughput and high sensitivity inspection
- DFC (Dark field real time classification)
Available: Taiwan |
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Unpatterned Wafer Surface Inspection System
Hitachi LS-6800
Hitachi LS-6800 is capable of detecting smaller than 40 nm defects on unpatterned wafers with high sensitivity and stable high throughput.

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- ulti-direction Detectors system
- igh Throughput and high sensitivity inspection
- evel Inspection Function
Available: Taiwan |
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Defect Review SEM System Dark Field Wafer Defect
Inspection System
Unpatterned Wafer Surface
Inspection System

Taiwan Contact:
Sharon_Chen@spirox.com.tw
Tel. +886 3 573 8099 ext. 2912
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