The PHEMOS®-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by semiconductor device defects.
Since the PHEMOS®-X is usable in combination with a general-purpose prober, you can do various analysis tasks by using the sample setups you are already familiar with. Installing an optional laser scan system allows acquiring high-resolution pattern images. Different types of detectors are available for various analysis techniques such as emission analysis, thermal analysis, and IR-OBIRCH analysis. The PHEMOS®-X supports a wide variety of tasks and applications ranging from prober socket boards to a large-size 300 mm wafer prober.
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Working range of the optical stage
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X：± 20mm
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* Working range might be narrower than these values due to the prober being used and interference with the sample stage or mounting of a NanoLens.
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Y：± 20mm
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Z：± 80mm
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Up to 5 types of objective lenses can be mounted on the motorized turret.
3 types of macro lenses are available. Only one macro lens can be installed on the system.
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Product Name
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Product No.
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N.A.
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WD(nm)
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Analysis
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Objective lens 1x for OBIRCH
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A7649-01
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0.03
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20
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OBIRCH
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Objective lens 2* IR coat
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A8009
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0.055
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34
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Enission / OBIRCH
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Objective lens NIR 5x
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A11315-01
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0.14
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37.5
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Enission / OBIRCH
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Objective lens NIR 20x
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A11315-03
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0.4
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20
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Enission / OBIRCH
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Objective lens PEIR Plan Apxo 20x2000
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A11315-21
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0.6
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10
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Enission / OBIRCH
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Objective lens PEIR Plan Apo 50x2000
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A11315-22
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0.7
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0.7
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Enission / OBIRCH
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High NA cbjective lens 50* for IR-OBIRCH
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A8018
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0.76
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12
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OBIRCH
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Objective lens NIR 100x
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A11315-05
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0.5
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12
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Enission / OBIRCH
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Objective lens MWIR 0.8x
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A10159-02
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0.13
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22
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Themal emission
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Objective lens MWIR 4x
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A10159-03
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0.52
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25
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Themal emission
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Objective lens MWIR 8x
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A10159-06
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0.75
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15
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Themal emission
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Product Name
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Product No.
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N.A.
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WD(nm)
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Analysis
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Macro lens 1.35x for PHEMOS -X
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A7909-16
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0.4
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25
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Enission / OBIRCH
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Macro lens 0.24x for InSb camera
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A10159-08
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0.08
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27
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Thermal emission
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Macro lens 1x for InSb camera
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A10159-10
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0.33
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52
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Thermal emission
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PHEMOS®-X
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Dimensions / Weights
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Main Unit
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1656 mm (W) × 2000 mm (H) × 1247 mm (D)
Approx. 1640 kg
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Operation Desk*1
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1000 mm (W) × 700 mm (H) × 800 mm (D)
Approx. 39.2 kg
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1480 mm (W) × 700 mm (H) × 800 mm (D)
Approx. 48.6 kg
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Line Voltage
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Single phase 200 V to 240 V
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Power Consumption
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Approx. 3300 VA
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Vacuum
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80 kPa or more
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Compressed Air*2
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0.6 MPa to 0.7 MPa
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Founded in 1953, HAMAMATSU Photonics Co., Ltd., is the pioneer of science and technology, coupled with the massive market share of optics science and EFA market. Hamamatsu Group's products are widely used in medical biology, high-energy physics, space exploration, precision analysis and other industries, is the optical industry leader. HAMAMATSU, with largest customer base in semiconductor and display industry, provides leading EFA solutions, OBIRCH emission microscope with high resolution location detection devices, and other professional optical products with technology patents. HAMAMATSU products are equipped with thermal, EMMI, OBIRCH functions.
