|
功能
|
特性
|
|---|---|
|
OBIRCH
|
|
|
EMMI相机
|
|
|
电流检测头
|
电流检测头可用于测量比标准OBIRCH放大器范围要求更高电压（最大3kv）或更高电流（最大6.3 A）的器件。
|
|
Product Name
|
Product No.
|
N.A.
|
WD(nm)
|
Analysis
|
|---|---|---|---|---|
|
Objective lens 1x for OBIRCH
|
A7649-01
|
0.03
|
20
|
OBIRCH
|
|
Objective lens 2* IR coat
|
A8009
|
0.055
|
34
|
Enission / OBIRCH
|
|
Objective lens NIR 5x
|
A11315-01
|
0.14
|
37.5
|
Enission / OBIRCH
|
|
Objective lens NIR 20x
|
A11315-03
|
0.4
|
20
|
Enission / OBIRCH
|
|
Objective lens PEIR Plan Apxo 20x2000
|
A11315-21
|
0.6
|
10
|
Enission / OBIRCH
|
|
Objective lens PEIR Plan Apo 50x2000
|
A11315-22
|
0.7
|
0.7
|
Enission / OBIRCH
|
|
High NA cbjective lens 50* for IR-OBIRCH
|
A8018
|
0.76
|
12
|
OBIRCH
|
|
Objective lens NIR 100x
|
A11315-05
|
0.5
|
12
|
Enission / OBIRCH
|
|
Objective lens MWIR 0.8x
|
A10159-02
|
0.13
|
22
|
Themal emission
|
|
Objective lens MWIR 4x
|
A10159-03
|
0.52
|
25
|
Themal emission
|
|
Objective lens MWIR 8x
|
A10159-06
|
0.75
|
15
|
Themal emission
|
|
Product Name
|
Product No.
|
N.A.
|
WD(nm)
|
Analysis
|
|---|---|---|---|---|
|
Macro lens 1.35x for PHEMOS -X
|
A7909-16
|
0.4
|
25
|
Enission / OBIRCH
|
|
Macro lens 0.24x for InSb camera
|
A10159-08
|
0.08
|
27
|
Thermal emission
|
|
Macro lens 1x for InSb camera
|
A10159-10
|
0.33
|
52
|
Thermal emission
|
日本滨松光子学株式会社（HAMAMATSU）是全球光子技术、EFA领域的领导品牌。自1953年成立以来，EFA失效分析产品销往全球半导体各大企业，拥有数量最多的半导体业及面板业客户。HAMAMATSU为客户提供EFA失效分析领域的缺陷定位解决方案，开发的微光显微镜是业界主流的高分辨率热点定位设备，且拥有多项专利产品。设备具备Thermal，EMMI，OBIRCH等分析功能方法。
